Publications

Technical papers

22nd European photovoltaic Solar Energy Conference and Exhibition, September 2007, Milan, Italy

(Paper) New compact  Silicon Nitride deposition system for 1500 Solar Cells per hour.

(Poster) OTB Solar's High throughput PECVD production tools for SiNx deposition on Silicon Solar Cells.

(Poster) DEPX1500: Fast deposition of high quality Silicon Nitide (>5 nm/sec).

21th European photovoltaic Solar Energy Conference and Exhibition, September 2006, Dresden, Germany 

(Paper) Characterization of stress in high-rate ETP deposited silicon nitride before and after annealing.

(Paper) State-of-the-art surface passivation by hydrogenated amorphous silicon deposited at rates > 1 nm/s by the expanding thermal plasma technique.

(Poster) Wafer heating with IR emitters on industrial PECVD tool.

2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, May 2005, Waikoloa, Hawaii

(Paper) Infrared heating with opaque quartz reflector technology

(Paper) High-rate deposition of silicon nitride and silicon oxide films for surface passivation and (anti)reflection coating applications

15th International Photovoltaic Science and Engineering Conference & Solar Energy Exhibition, October 2005, Shanghai - China

(Paper) High-quality surface passivation obtained by high-rate deposited silicon nitride, silicon dioxide and amorphous silicon using the versatile expanding thermal plasma technique.

(Paper) Good surface passivation of c-Si by high-rate plasma deposited silicon oxide.

20th European Photovoltaic Solar Energy Conference, June 2005, Barcelona - Spain

(Paper) A novel commercial plasma source for ultra high-rate deposition of silicon nitride for c-Si solar cells.

(Paper) Industrial high-rate (¡Ý 4 nm/s) deposited silicon nitride with low surface recombination velocities under optimum antireflection coating conditions.

(Paper) Application of ultra high-rate ETP deposited silicon nitride for screen printed crystalline silicon solar cells.

(Poster) Excellent bulk passivation and good surface passivation for high mass density SiN deposited at ultra-high deposition rate.

31st IEEE Photovoltaic Specialist Conference, January 2005, Florida - USA

(Paper) Controlling the silicon nitride film density for ultrahigh-rate deposition of top quality antireflection coatings.

(Paper) Plasma properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells.

(Oral Pres.) Ultra high-rate ETP deposited silicon nitride for >15% in-line processed multicrystalline silicon solar cells.

19th EU PVSEC, June 2004, Paris - France

(Paper) Effects of different firing profiles on layer characteristics and passivation properties of industrial ETP deposited silicon nitride films.

(Paper) High-throughput PECVD production tool for in-line Silicon-Nitride deposition on silicon solar cells.

Other publications

Progress in photovoltaics: Research and applications

(Publication) Industrial high-rate (~5 nm/s) deposited silicon nitride yielding high-quality bulk and surface passivation under optimum anti-reflection coating conditions.

Semiconductor Fabtech ¨C 27th Edition

(Publication) Vacuum solution for the load locks in the DEPx coating system (new molecular pumps working against atmosphere)