DEPx - the World's highest speed SiNx deposition system
OTB Solar has developed a deposition system for anti-reflective layers and passivation: the DEPX. The equipment incorporates new technologies such as a magnetic carrier transport system and our ultra fast Plasma Enhanced CVD source (PECVD).
Our ARC system deposits a hydrogenated silicon nitride (SiN:H) Anti-Reflective Coating (ARC) on the emitter side of the cell to improve the light coupling. The SiNx layer contains hydrogen, which will diffuse into the wafer during a subsequent thermal treatment (firing), thereby improving the material quality.
An important benefit of the cascade plasma source is the fact that it generates remote plasma, which means that plasma production, transport and deposition are geometrically separated. The substrate does not play a role in plasma production and ion bombardment of high-energy particles on the substrate is virtually absent. Furthermore, in contrast to other remote plasmas, the downstream properties have no influence on the plasma production zone. Since many of the plasma parameters can be independently changed, the deposition rate of the film can be optimized.
DEPx2000 series are realized with financial contributions from the European Fund for Regional Development within the scope of OP-Zuid, the Dutch Ministry of Economic affairs and the Province Noord-Brabant.
 |
 |
 |
 |
Luchthavenweg 10
5657 EB Eindhoven
The Netherlands
P: + 31 (0) 40 2581 581
F: + 31 (0) 40 2509 855
E: info@otb-solar.com
Related Topics
Product Sheet DEPx
Download our DEPx brochure [PDF]